Title Modular teaching and learning offers for contemporary and needed further education
Project Number D/04/B/F/PP-146 157
Product Effect of aragon and substrate bias on
Title Effect of aragon and substrate bias on
Product Type modules
Continuous and smooth nanocrystalline diamond (NCD) thin films were successfully grown on mirror polished silicon substrates, using double bias plasma enhanced hot filament chemical vapour deposition (HFCVD) technique. A gas mixture of Ar–CH4–H2 and CH4–H2 was used as the precursor gas. The effect of the gas flow rate, substrate temperature and substrate bias during deposition on diamond crystallite size was investigated. Changing the growth parameters facilitates to control grain size of polycrystalline (PCD) diamond thin films from microcrystalline to nanocrystalline. The structure of fine grained NCD films has been studied with Scanning Electron Microscopy (SEM) and Raman spectroscopy.
Research centre, universities, industry
Nanocrystalline diamond films were successfully prepared by HFCVD from CH4/H2 and CH4/H2/Ar gas mixtures with and without use of negative substrate bias. The grain size of the NCD films using argon and substrate bias was about 5-30 nm. We have shown that decreasing the relative amount of hydrogen in the gas mixture and application of negative substrate bias during deposition, both changed the surface morphology of PCD from microcrystalline to nanocrystalline.
Area of application
Thin film Industry
Specialize vacuum technology lab